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Article: Optical Lithography Refinement Essential to Meet Increasing Challenge from NGL Technologies.
- Article from:
- Business Wire
- Article date:
- August 16, 2004
CopyrightCOPYRIGHT 2004 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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PALO ALTO, Calif. -- Optical lithography may currently offer the advantage of high wafer throughputs, but to sustain in the long term and compete with the next generation lithography (NGL) technologies, it must deliver finer resolution and achieve the desired quality, reliability, and cost targets.
"Constant improvements in optical lithography are likely to play a crucial role in assisting the semiconductor industry to achieve shrinking device sizes and increased chip performance," says Technical Insights Research Analyst Sivakumar Muthuramalingam.
Extending optical lithography toward the 193-nm wavelength is expected to provide feature sizes of 65-nm ...