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Article: Varian Semiconductor Launches VIISta 810XE Ion Implanter; New Single Wafer Ion Implanter Extends VSEA's Lead in Medium Current.
- Article from:
- Business Wire
- Article date:
- October 12, 2004
CopyrightCOPYRIGHT 2004 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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GLOUCESTER, Mass. -- Varian Semiconductor Equipment Associates, Inc. (NASDAQ: VSEA) introduced today its single wafer VIISta 810XE medium current ion implanter. Based on the VIISta 810EHP industry benchmark for medium current performance, the VIISta 810XE is designed to deliver the highest productivity and process performance. Multiple orders for the VIISta 810XE have already been received. The initial shipments will go to a DRAM manufacturer in Taiwan.
"The VIISta 810XE ion implanter takes the best of the VIISta 810EHP product attributes and combines them with both increased low energy beam current and maximum throughput that exceeds 400 wafers per hour, and an ...