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Article: EV Group Launches a Step-and-Repeat Nanoimprint Lithography System for Industrial Fabrication of Nanoscale Devices.
- Article from:
- Business Wire
- Article date:
- December 14, 2004
CopyrightCOPYRIGHT 2004 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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SCHARDING, Austria -- EV Group (EVG), a leading manufacturer of MEMS, nano and semiconductor wafer-processing equipment, said today it will install a fully automated, ultra-violet step-and-repeat nanoimprint lithography (UV-NIL) system at AMO GmbH (AMO) in Germany.
UV-NIL is a next-generation lithography technology and a contender to succeed optical lithography for the 32-nm node, according to the International Technology Roadmap of Semiconductor (ITRS). Applications include integrated photonic devices, nanoelectronics, life sciences, patterned media and next-generation memories.
"Nanoimprint lithography is an innovative patterning technology that ...