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Article: Mattson Technology Extends Strip Productivity With New Strip System; Aspen III ICPHT Delivers Exceptional Throughput and CoO for High-Volume Resist Strip Applications.
- Article from:
- PR Newswire
- Article date:
- April 19, 2004
CopyrightCOPYRIGHT 2004 PR Newswire Association LLC. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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Mattson Technology, Inc. , a leading supplier of advanced process equipment used to manufacture semiconductors, today introduced its new Aspen III ICPHT dry strip system. This new system provides chipmakers a significant productivity improvement for all strip applications in high-volume manufacturing of DRAM, logic and flash memory devices.
The ICPHT builds upon Mattson's field-proven Aspen platform, over 900 of which are installed in customer fabs worldwide, and offers uniform and repeatable processing while providing a wider process window and compatibility with a variety of chemistries to handle dry strip and residue removal applications. Utilizing an advanced ...