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Article: Strip system.(New Products)(Mattson Technology Inc. introduces Aspen III eHighlands )(Brief Article)
- Article from:
- Semiconductor International
- Article date:
- August 1, 2005
CopyrightCOPYRIGHT 2005 Reed Business Information, Inc. (US). This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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The Aspen III eHighlands is a dry strip system designed for critical front-end-of-line and back-end-of-line sub-90 nm process applications. The system features an inductively coupled plasma source and a bias capability that enables independent control of ion energy and ion density at low pressures to minimize damage to low-k materials. It features a ...