Article: KLA-Tencor's K-T Analyzer Enables Real-Time Patterning Control for 65-nm and Below IC Manufacturing.

Automated Lithography Cell Correctables Solution Speeds Decision Making for Advanced Process Control

SAN JOSE, Calif., Feb. 21 /PRNewswire-FirstCall/ -- KLA-Tencor today formally unveiled the K-T Analyzer lithography correctables platform to effectively accelerate and improve advanced lithography cell qualification and control. Seamlessly integrated with KLA- Tencor's Archer overlay, eCD CD SEM, and SpectraCD optical CD metrology platforms for 65-nm and below IC production, K-T Analyzer provides automated, on-tool analysis of overlay and critical dimension (CD) metrology data in real time -- giving engineers immediate feedback on the quality of their ...

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