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Article: KLA-Tencor's K-T Analyzer Enables Real-Time Patterning Control for 65-nm and Below IC Manufacturing.
- Article from:
- PR Newswire
- Article date:
- February 21, 2006
CopyrightCOPYRIGHT 2006 PR Newswire Association LLC. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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Automated Lithography Cell Correctables Solution Speeds Decision Making for Advanced Process Control
SAN JOSE, Calif., Feb. 21 /PRNewswire-FirstCall/ -- KLA-Tencor today formally unveiled the K-T Analyzer lithography correctables platform to effectively accelerate and improve advanced lithography cell qualification and control. Seamlessly integrated with KLA- Tencor's Archer overlay, eCD CD SEM, and SpectraCD optical CD metrology platforms for 65-nm and below IC production, K-T Analyzer provides automated, on-tool analysis of overlay and critical dimension (CD) metrology data in real time -- giving engineers immediate feedback on the quality of their ...