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Article: ALD NanoSolutions, Inc. Earns the 2006 Frost & Sullivan Excellence in Technology Award for Its Atomic Layer Deposition Techniques.
- Article from:
- PR Newswire
- Article date:
- March 20, 2006
CopyrightCOPYRIGHT 2006 PR Newswire Association LLC. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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PALO ALTO, Calif., March 20 /PRNewswire/ -- Frost & Sullivan's recent analysis of the advanced coatings & surface technology market has recognized ALD NanoSolutions, Inc. with the 2006 Excellence in Technology Award for developing and commercializing path breaking atomic layer deposition (ALD) techniques. The two primary techniques that have been developed are Particle ALD(TM) and Polymer ALD(TM) for nanocoating conformal inorganic films on individual particles and polymer substrates, respectively.
ALD NanoSolutions is developing sophisticated ALD techniques that can be used in advanced materials, microelectronics, and on biomedical, defense and consumer ...
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