|
|
Article: Fine lines in high yield (Part CXXXIII): safe lighting in yellow room exposure areas.(Tech Talk)
- Article from:
- CircuiTree
- Article date:
- October 1, 2006
- Author:
CopyrightCOPYRIGHT 2006 BNP Media. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
|
The subject of Safe Lighting has been previously covered in Tech Talk (No. 71, August, 2001). This column includes some updates, mostly concerning sourcing. The PWB industry standard photolithographic process uses negative working photoresists exposed with UV radiation in the near UV range, whereby the photoresist UV-radiation sensitivity is peaking around 365nm. More correctly, the photoresist is not only sensitive to UV radiation but also to near-UV visible light in the 410 to 430nm range which makes up the violet and blue light of the visible spectrum. This visible light is not "safe," i.e. it can lead to premature polymerization of the photoresist after the dry film ...
Related newspaper, magazine, and journal articles:
|
|
Article: Resist technology concentrates on 248 nm.
Semiconductor International;
February 1, 2003 ;
700+ words
... ... reduction in resist selectivity. Also, resists are getting thinner ... technology. The resist materials aren't as mature as 248 resists, delaying 193 ... premium on the resist's etch tolerance ... CDs shrink and resists thin, it exacerbates ...
|
|