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Article: Cabot Microelectronics Corporation Announces a Major Advance in CMP Polishing Pads, the Epic(R) D100.
- Article from:
- Business Wire
- Article date:
- January 3, 2007
CopyrightCOPYRIGHT 2007 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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AURORA, Ill. -- Cabot Microelectronics Corporation (NASDAQ:CCMP), the leading supplier of chemical mechanical planarization (CMP) polishing slurries to the semiconductor industry, announces the global introduction of its new CMP polishing pad, the Epic D100.
The Epic D100 pad represents what we believe is a major breakthrough in CMP polishing pad technology. Currently used in high volume manufacturing by integrated circuit device manufacturers, the Epic D100 is the result of extensive research intended to deliver a step change improvement in CMP pad life and pad-to-pad consistency. Customers are successfully qualifying and using the Epic D100 for dielectric, ...