Article: FUEL LINE DEFECT LEADS TO FORD TRUCK RECALL.(MAIN)

Article: Tencor Instruments Unveils Surfscan AIT Wafer Inspection System; ...
Business Wire;  October 23, 1995 ;     700+ words ... ... TNCR) today unveiled a revolutionary new system for in-line defect inspection of advanced logic and memory devices -- the Surfscan ... initiated the program in response to the critical need for an in-line defect inspection system for 0.25-micron technology, as outlined ...

Dictionary definition: line defect
A Dictionary of Physics;      219 words ...line defect See defect .

Article: Gas line defect behind Sulaimaniya blast -- source.
Aswat al-Iraq (Erbil, Iraq);  November 17, 2008 ;     472 words ...Byline: AmR (S) (Category:Security) SULAIMANIYA / Aswat al-Iraq: The blast that took place in Sulaimaniya was caused by a defect in a gas line, the Kurdish province's security director said, dismissing any terrorist or sabotage acts . Brig. Hassan Nouri had said that the number of people wounded in

Article: KLA-Tencor Adds In-Line Defect Classification to ...
PR Newswire;  February 19, 2002 ;     700+ words ...SAN JOSE, Calif. -- KLA-Tencor Corp. today announced that its latest-generation e-beam wafer inspection system, the eS20XP, now includes in-line automatic defect classification (iADC). This new option speeds time to results for defect classification and review by up to a factor of three when

Article: Japanese Inventors Develop Semiconductor Production Line ...
US Fed News Service, Including US State News;  July 26, 2007 ;     538 words ...ALEXANDRIA, Va., July 26 -- Akira Hamamatsu, Sachio Uto and Yoshimasa Ohshima, all from Yokohama, Japan, Minori Noguchi of Mitsukaido, Japan, Hidetoshi Nishiyama of Fujisawa, Japan, and Takahiro Jingu of Takasaki, Japan, have developed a technology for inspecting foreign matters in semiconductor

Article: The track to truth; Rail chiefs 'knew of line ...
The Mail on Sunday (London, England);  February 4, 2001 ;     670 words ...Byline: ANDREW BEAVEN RAILTRACK was last night at the centre of a fresh controversy after one of their top officials in Scotland admitted the firm had known 'for two or three years' about line defects like the one responsible for the Hatfield tragedy. In what was described as a 'shocking

Article: Applied Materials Announces New SEMVision G2 System for Sub-100nm ...
Business Wire;  June 26, 2002 ;     700+ words ...Business Editors/High-Tech Writers NOTE TO MEDIA: Multimedia assets available SEMVision G2 Leapfrogs Market-Leading SEMVision Technology to Enable Nanometer-Scale Chip Manufacturing Applied Materials, Inc. today introduced its latest defect review system, the SEMVision(TM) G2, for