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Article: Cabot Microelectronics Announces a Major Improvement in Copper Barrier CMP Technology with its B6600 Series of CMP Slurries for Low K Devices.
- Article from:
- Business Wire
- Article date:
- July 9, 2007
CopyrightCOPYRIGHT 2007 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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AURORA, Ill. -- Cabot Microelectronics Corporation (NASDAQ:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries to the semiconductor industry, announces a major breakthrough in its CMP technology with improvements to its B6600 platform of barrier CMP slurries for advanced technology nodes.
Cabot Microelectronics is the leading supplier of copper polishing slurry solutions for the semiconductor industry. The B6600 barrier slurry platform builds on Cabot Microelectronics' industry-leading CMP slurry technology and is the result of extensive research and development by Cabot Microelectronics intended to deliver an ...