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Article: Copolymerization of t-butoxycarbonyloxystyrene and sulfur dioxide.
- Article from:
- Polymer Engineering and Science
- Article date:
- June 1, 1995
- Author:
CopyrightCOPYRIGHT 1995 Society of Plastics Engineers, Inc. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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INTRODUCTION
Polysulfones have proven useful in microlithography, primarily because of their high sensitivity to radiation (6). For instance, poly(1-butene-sulfone), a positive-acting electron beam resist widely used in the production of photomasks, is more than an order of magnitude more sensitive than the standard resist, poly(methyl methacrylate) (7). A variety of other polysulfones have been synthesized and evaluated as positive resist materials (8-10).
Recently, copolymers of t-butoxycarbonyloxystyrene (TBS) and sulfur dioxide have been evaluated for use in chemically amplified deep-UV photoresist formulations (11-13). In the chemical amplification ...