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Article: Third generation MeV ion implanter introduced by Genus Inc.; established technology with design improvements drives lower MeV cost-of-ownership, reduced time-to-market.
- Article from:
- Business Wire
- Article date:
- November 8, 1995
CopyrightCOPYRIGHT 1995 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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SUNNYVALE, Calif.--(BUSINESS WIRE)--Nov. 8, 1995--Genus Inc. (NASDAQ:GGNS) Wednesday unveiled a new MeV ion implanter which provides a smaller system footprint, higher performance, and lower cost of ownership than comparable MeV systems.
The new Tandetron (TM) 1520 is 13 percent smaller, produces five times fewer particles and reduces utilities consumption costs by as much as 66 percent compared with competing systems, said product manager Jim Kawski.
The 1520 also features significant production throughput advantages for MeV applications, Kawski said, including 50 percent higher throughput for single implants and 66 percent better throughput for chained ...