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Article: Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development.
- Article from:
- China Weekly News
- Article date:
- May 5, 2009
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Toppan Printing Co., Ltd. (Toppan Printing; Head office: Chiyoda-ku, Tokyo; President & CEO: Naoki Adachi) has established a new and improved photomask manufacturing process in April 2009 at its photomask facility in Asaka, Japan, to support 32nm and 28nm semiconductor device production. This photomask process was achieved through Toppan's ongoing joint development project with IBM. The Toppan photomasks produced in Asaka are compatible with those produced at IBM's photomask facility in Essex Junction, Vt., and have been qualified by IBM.
Photomasks are an integral component in the patterning and manufacturing of semiconductor devices. Today, the 32nm ...