|
|
Article: Studies in the area of nanoscience reported from S.F. Ahmed and co-researchers.
- Article from:
- Nanotechnology Weekly
- Article date:
- September 28, 2009
CopyrightCOPYRIGHT 2009 NewsRX. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
|
"Fluorinated DLC films were deposited via plasma enhanced chemical vapor deposition technique on glass and silicon substrates. The precursor gas used was acetylene and for fluorine incorporation hydrofluoric acid dissolved in methanol was used," researchers in Calcutta, India report.
"The at.% of fluorine in the films was varied from 0% to 15.3% as measured from energy dispersive X-ray analysis. The chemical binding was investigated by XPS studies. AFM studies showed that the increase of surface roughness with fluorine percentage. We have studied electron field emission from F:DLC thin films for a fixed anode-sample separation of 100 mu m for different F at.% in ...