|
|
Article: Tessera to Present at International Symposium on Immersion Lithography Extensions.
- Article from:
- Business Wire
- Article date:
- October 13, 2009
CopyrightCOPYRIGHT 2009 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
|
SAN JOSE, Calif. -- Tessera Technologies, Inc. (Nasdaq:TSRA) will present at SEMATECH's 6th International Symposium on Immersion Lithography Extensions on the latest in modeling and optical performance for diffractive optical elements (DOEs) in immersion lithography.
[TABLE OMITTED]
Safe Harbor Statement
This press release contains forward-looking statements, which are made pursuant to the safe harbor provisions of the Private Securities Litigation Reform Act of 1995. Forward-looking statements involve risks and uncertainties that could cause actual results to differ significantly from those projected, particularly with respect to Tessera's ...