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Article: Research from J. Ihlemann and co-researchers in the area of science published.
- Article from:
- Chemicals & Chemistry
- Article date:
- November 13, 2009
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According to recent research from Germany, "The laser based fabrication of surface relief SiO2 phase masks is demonstrated: First, a UV-absorbing coating of silicon monoxide (SiO, thickness 150-300 nm) is deposited on a fused silica substrate."
"Second, the SiO-coating is patterned by excimer laser ablation (248 nm or 193 nm) at fluences of 0.2 to 0.5 J/cm(2) to form the desired phase structure. Third, the SiO-material is oxidized to UV-transparent silicon dioxide (SiO2)," wrote J. Ihlemann and colleagues.
The researchers concluded: "Applications of these phase masks in combination with suitable imaging optics for efficient laser micro machining are ...