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Article: Novellus Improves Tungsten Resistivity Performance With Advanced LRWxT Process.
- Article from:
- Nanotechnology Weekly
- Article date:
- November 16, 2009
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Novellus Systems (NASDAQ:NVLS) announced that it has developed a new tungsten deposition process, called LRWxT, that can effectively reduce contact and line resistance at the 3Xnm technology node compared to conventional tungsten chemical vapor deposition (CVD-W) technology. The new approach uses the company's ALTUS[R] Max system for a unique deposition process sequence that results in highly conformal, large grain size films with lower tungsten bulk resistivity. The new process was developed and tested on device features provided by NEC Electronics, and the breakthrough was presented at this year's annual Advanced Metallization Conference in Baltimore.
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