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Article: Tokyo Electron Limited Announces Production Equipment for Low K Dielectric Processing in Advanced Semiconductor Devices.
- Article from:
- Business Wire
- Article date:
- November 20, 1998
CopyrightCOPYRIGHT 1998 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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TOKYO--(BUSINESS WIRE)--Nov. 20, 1998--Tokyo Electron Limited (TEL) recently announced the introduction of its new ACT 8 SOD system for the application and processing of most popular spin-on dielectric materials.
The ACT 8 SOD will be launched at a special TEL Low K Dielectric technology seminar on Dec. 4, 1998 in conjunction with the SEMICON/Japan `99 trade show. In this seminar, TEL systems and process results for spin-on application, curing, and etching of Low K dielectric films will be presented.
TEL products represented in the seminar include Clean Track ACT 8 for application of Low K films, Alpha 8 Furnace for curing of some Low K films, and Unity ...