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Article: Etec Systems, Inc. Announces ALTA 3700 High-Throughput Laser Mask Pattern Generation System.
- Article from:
- Business Wire
- Article date:
- February 29, 2000
CopyrightCOPYRIGHT 2000 Business Wire. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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Business Editors/High-tech Writers
HAYWARD, Calif.--(BUSINESS WIRE)--Feb. 29, 2000
Etec Systems, Inc. (Nasdaq: ETEC), a leader in patterning solutions for the worldwide semiconductor and electronics industries, today announced the introduction of the ALTA(R) 3700 system for volume mask production at 180 nanometer and smaller device rules.
The ALTA 3700 is an extension of the production-proven ALTA 3500 laser pattern generation system and offers significant advances in lithographic quality over previous systems, particularly in critical dimension (CD) and registration capability.
The ALTA 3700 improves upon the proven ...
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