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Article: Ibis Technology and Lawrence Berkeley National Laboratory Announce Cooperative R&D Agreement to Develop New Ion Source.
- Article from:
- Business Wire
- Article date:
- March 14, 2000
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Business/Technology Editors
DANVERS, Mass.--(BUSINESS WIRE)--March 14, 2000
Ibis Technology Corporation (NASDAQ: IBIS), a leading supplier of SIMOX-SOI (Separation by IMplantation of OXygen / Silicon-On-Insulator) implantation equipment and wafers for semiconductor manufacturers, entered into a cooperative R&D agreement with the U.S. Department of Energy's Lawrence Berkeley National Laboratory to develop an RF inductively coupled ion source.
Under the terms of the agreement, Dr. Ka-Ngo Leung and his staff will develop an ion source suitable for the Ibis 2000 SIMOX-SOI implanter. This ion source, scheduled to be completed in December, will use ...