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Article: Micronic Introduces Sigma7100 Pattern Generator and the Mix & Match Concept for 130 nm Photomasks.
- Article from:
- Business Wire
- Article date:
- April 23, 2001
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Business Editors
TABY, Sweden--(BUSINESS WIRE)--April 23, 2001
Micronic Laser Systems AB (Stockholmsborsen's Attract 40-list: MICR), a leading manufacturer of laser pattern generation equipment to the semiconductor and display industries, today introduced Sigma7100 pattern generator and the new concept, the Micronic Mix and Match solution, which is based on the unique combination of the Sigma7100 and the Omega6600 pattern generators.
"We are very pleased to announce that development of our SLM technology has progressed to the point that we now launch the Sigma7100 for 100 nm design node," said Sven Lofquist, Micronic's president and CEO.
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