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Article: Technology to Eliminate Particles Generated In Plasma Space.
- Article from:
- Japanese New Materials
- Article date:
- August 1, 2001
CopyrightCOPYRIGHT 2001 Newmedia International Japan. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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Tohoku Techno Arch Co. has developed a technology to eliminate the ultrafine particles generated in plasma space.
This new technique is described as indispensable in the Plasma Process for the manufacture of ultrathin high-functional films.
The Plasma Process is said to have become indispensable in the manufacturing processes for high-functional thin films and advanced semiconductors.
There is an ever increasing demand to make devices more integrated, multifunctional and efficient. The technologies for accumulating and processing various types of materials and functional thin films such as oxide and nitride films, by methods of plasma wafer ...