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Silicon thread on nanometre scale.(Brief Article)
- Article from:
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Japanese Nanotechnologies
- Article date:
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December 1, 2001
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Copyright informationCOPYRIGHT 2001 Newmedia International Japan. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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An Osaka University R & D team, has developed a technology for the production of nanometre dimensioned functional silicon threads, which the team believes will offer a non complex method of fabricating nanoscale devices.
The two materials from which electronic components are fabricated are semiconducting silicon, and insulating silicon dioxide, and the newly developed thread, described as having a thickness of' a few nanometres' is formed by alternating the two materials every other designated nanometre.
According to the R & D team's published report, the thread is structured as follows:
1) Molten microparticles of gold are ...