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Article: Making a mark with near-field optical lithography: Naya Masayuki reports on fuji photo film's breakthrough development of a high aspect ratio microprocessing technique using near-field light. (New Technology).(Brief Article)
- Article from:
- Look Japan
- Article date:
- December 1, 2001
- Author:
CopyrightCOPYRIGHT 2001 Look Japan, Ltd. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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IN the realm of computers and telecommunications, there is no limit to demands for greater speed and greater capacity. To try to satisfy the demand, electronics devices and optical devices are taking the route of super-high integration. The most important issue facing greater integration is to increase the resolution of lithography and vast investments have been put into research in this area.
In order to increase the resolution of optical lithography for industrial purposes, the wavelength of the exposure light source must be shortened. So far, resolutions of 130 nanometers have been achieved with KrF (248 nm) and ArF (193 nm) excimer laser steppers and a ...