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Article: ASM announces joint Aluminium CVD development with AT&T. (ASM International N.V., Aluminium Chemical Vapor Deposition)
- Article from:
- PR Newswire
- Article date:
- June 12, 1990
CopyrightCOPYRIGHT 1990 PR Newswire Association LLC. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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ASM ANNOUNCES JOINT ALUMINUM CVD DEVELOPMENT WITH AT&T
BILTHOVEN, The Netherlands, June 12 /PRNewswire/ -- ASM International N.V. (NASDAQ: ASMIF), the Netherlands-headquartered manufacturer of semiconductor production equipment, announced today a joint agreement with AT&T (NYSE: T) to complete the development of Aluminum Chemical Vapor Deposition (Aluminum CVD).
Aluminum Chemical Vapor Deposition is a metallization technology for use in the production of advanced semiconductors. This CVD process provides better properties of aluminum films than those produced by physical vapor deposition. Aluminum CVD also provides an alternative to Tungsten CVD at a ...