|
|
Article: Vacuum furnaces designed for advanced CVD system; chemical vapor deposition systems require either hot wall furnaces or cold wall, vacuum-type furnaces.
- Article from:
- Ceramic Industry
- Article date:
- October 1, 1990
- Author:
CopyrightCOPYRIGHT 1990 BNP Media. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
|
Vacuum Furnaces Designed for Advanced CVD Systems
Chemical vapor deposition is based on the chemical reaction between a gaseous phase and the heated surface of a substrate. Most CVD processes are carried out in open loop systems. Reactant gases are continuously supplied to the system, while the reaction gases are continually removed. A "hot" process, it is carried out generally in temperatures ranging from 500 [degrees] C to 1100 [degrees] C.
CVD systems are used to form very thin layers, usually no more than several thousandths of an inch thick. The deposits attach themselves to the substrates. The substrate surface acts as a catalyst upon which the coating ...
Related newspaper, magazine, and journal articles:
|
|
Article: Air Liquide and ATMI Team Up to Deliver Productivity and Safety ...
PR Newswire;
July 15, 2003 ;
700+ words
...HOUSTON, July 15 /PRNewswire/ -- Air Liquide, a worldwide leader of integrated solutions for the semiconductor industry, and ATMI, Inc., a leading supplier of advanced materials and related equipment to the semiconductor manufacturers, today announced an alliance to promote the productivity and
|
|