|
|
Article: Mass flow sensors: measuring up to new applications.
- Article from:
- Mechanical Engineering-CIME
- Article date:
- May 1, 1990
- Author:
CopyrightCOPYRIGHT 1990 American Society of Mechanical Engineers. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
|
Mass Flow Sensors: Measuring Up To New Applications
When Technical Specialist Gaspare Messina of General Instrument Corp.'s Wafer D Engineering Division (Hicksville, N.Y.) was informed that a new R&D project would require reactive sputtering, he realized the division's existing sputtering system wasn't capable of it. Designed to control the flow of one gas into the sputtering chamber using only a rotameter, it couldn't control the flow rates of a combination of gases. The new project required a machine capable of channeling precise amounts of nitrogen and argon into the sputtering chambers where this combination of inert and reactive gases could then bombard ...