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Article: Genus Inc. launches integrated CVD/ETCH system (chemical vapor deposition) (product announcement)
- Article from:
- PR Newswire
- Article date:
- October 19, 1990
CopyrightCOPYRIGHT 1990 PR Newswire Association LLC. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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GENUS INC. LAUNCHES INTEGRATED CVD/ETCH SYSTEM
MOUNTAIN VIEW, Calif., Oct. 18 /PRNewswire/ -- Genus Inc. (NASDAQ: GGNS) today introduced its new integrated system, the 6000, at ceremonies held at corporate headquarter in Mountain View, Calif. The system will be displayed at Semicon Japan, a semiconductor equipment tradeshow to be held in Tokyo next week. The 6000 system integrates blanket tungsten chemical vapor deposition (CVD) and etch processes for volume production of tungsten plugs. It sets a new standard for etch- back plugs in advanced semiconductors in high throughput environments. Genus guarantees the 6000 system to provide void-free tungsten plugs ...
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