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Article: Lam unveils new CVD product platform; achieves process breakthrough for advanced semiconductor film depostion. (Lam Research Corp., Chemical Vapor Disposition)
- Article from:
- PR Newswire
- Article date:
- October 24, 1990
CopyrightCOPYRIGHT 1990 PR Newswire Association LLC. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan. All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)
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LAM UNVEILS NEW CVD PRODUCT PLATFORM; ACHIEVES PROCESS
BREAKTHROUGH FOR ADVANCED SEMICONDUCTOR FILM DEPOSITION
FREMONT, Calif., Oct. 23 /PRNewswire/ -- Lam Research Corp. (NASDAQ: LRCX) today unveiled an innovative chemical vapor deposition (CVD) product platform, designated the Integrity series. Representing a radical departure from traditional CVD system design, Integrity delivers two firsts to the global semiconductor industry. It is the first CVD system in which process performance has been approached from a hardware standpoint. It is also the only commercially available CVD tool to integrate several process steps within a single chamber, ...