Article: GE Global Research and Molecular Nanosystems to develop nanostructure-based field emission devices.

Business Editors

NISKAYUNA, N.Y.--(BUSINESS WIRE)--Dec. 20, 2002

GE Global Research and Molecular Nanosystems (Palo Alto, CA) have jointly won a National Institute of Standards and Technology (NIST) Advanced Technology Program (ATP) award to develop a template synthesis platform for growing large arrays of aligned nanorods.

The three-year, $5.8 million program is focused on taking nanotechnology out of the lab and onto the manufacturing floor by creating a scalable, low-cost platform to precisely control the structure and fabrication of advanced materials. These materials can be used in highly specialized applications from medical imaging ...

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