Article: IBM and Mentor Graphics to Develop 22nm Computational Lithography Solution for Integrated Circuit Industry


Wireless News
09-23-2008
IBM and Mentor Graphics to Develop 22nm Computational Lithography Solution for Integrated Circuit Industry

WIRELESS NEWS-September 23, 2008-IBM and Mentor Graphics to Develop 22nm Computational Lithography Solution for Integrated Circuit Industry (C)2008 10Meters - http://www.10meters.com

IBM and Mentor Graphics have announced an agreement to develop and distribute computational lithography (CL) software solutions to expand the imaging capability of lithographic systems used in the manufacturing of integrated circuits at the 22 nanometer (nm) node.
The agreement is part of IBM's computation scaling initiative to create computationally based process for production ...

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