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Article: Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development

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Wireless News
Article date:
April 24, 2009
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Wireless News
04-24-2009
Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development
Type: News

Toppan Printing reported it established a photomask manufacturing process this month at its photomask facility in Asaka, Japan, to support 32nm and 28nm semiconductor device production.

The company said the photomask process was achieved through Toppan's ongoing joint development project with IBM. The Toppan photomasks produced in Asaka are compatible with those produced at IBM's photomask facility in Essex Junction, Vt., and have been qualified by IBM.
Photomasks are a component in the patterning and manufacturing of semiconductor devices. Advanced ...

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