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Article: Toppan Printing Completes 32nm and 28nm Production Photomask Process Via Joint Development with IBM

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Wireless News
Article date:
April 26, 2009
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Wireless News
04-26-2009
Toppan Printing Completes 32nm and 28nm Production Photomask Process Via Joint Development with IBM
Type: News

Toppan Printing reported it has established a photomask manufacturing process in April at its photomask facility in Asaka, Japan, to support 32nm and 28nm semiconductor device production.

The photomask process was achieved through Toppan's ongoing joint development project with IBM. The Toppan photomasks produced in Asaka are compatible with those produced at IBM's photomask facility in Essex Junction, Vt., and have been qualified by IBM.
Photomasks are a component in the patterning and manufacturing of semiconductor devices. Advanced devices, such as ...

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