Article: Japanese Inventors Develop Pattern Forming Method

Article: Patents: Idaho Inventors Develop Masking Material
US Fed News Service, Including US State News;  February 6, 2009 ;     401 words ... ... methods. In one implementation, a masking material which includes boron doped amorphous ... semiconductor substrate. The masking material includes at least about 0.5 atomic percent boron. The masking material is substantially anisotropically ...

Article: Minnesota, Wisconsin Inventors Develop Masking ...
US Fed News Service, Including US State News;  September 4, 2007 ;     635 words ... ... H. Heil of New Richmond, Wis., have developed a masking material roll. According to the U.S. Patent & Trademark Office, the invention relates to a "roll of masking material comprising a coiled elongate thin flexible sheet, which ...

Article: Top Sound International acquires marketing rights to new ...
PR Newswire;  November 28, 1988 ;     700+ words ... ... agreement with INTERMALL AB of Tjallmo, Sweden which gives Top Sound International exclusive marketing rights to a new masking material technology. The marketing rights cover all of North America and the Far East. Other international markets are currently ...

Article: Innovative masking material.
Design News;  September 26, 2005 ;     453 words ...(Buffalo, N.Y.) -- Flex500PLUS[TM] is an innovative material that provides flexible high temperature masking protection without the high cost. Flex500Plus parts are so economical you can afford to use them as one-time throwaways and save even further by eliminating the need to clean and reuse the

Article: Innovative masking material.(NEW PRODUCTS)
Products Finishing;  March 1, 2007 ;     356 words ...Flex500PLUS[TM] is an innovative material that provides flexible high temperature masking protection without the high cost. Flex500Plus parts are so economical you can afford to use them as one-time throwaways and save even further by eliminating the need to clean and reuse the parts. Designed to

Article: Japanese Inventors Develop Masking Material
US Fed News Service, Including US State News;  February 7, 2007 ;     457 words ...ALEXANDRIA, Va., Feb. 7 -- Masanori Ogawa and Kuninori Itou, both of Tokai, Japan, have developed a masking member used to protect a part of an article from being coated. According to the U.S. Patent & Trademark Office: "The object of the present invention is to provide a masking member which

Article: Patent No. 7,569,417 Issued on Aug. 4, Assigned to Samsung ...
US Fed News Service, Including US State News;  August 7, 2009 ;     538 words ... ... method of forming a phase changeable material layer. The inventors were issued U.S ... Trademark Office: "A phase changeable material layer usable in a semiconductor memory device ... first layer to form a first composite material layer including a germanium-tellurium composite ...