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Article: Massachusetts Inventors Develop Ion Implanter System Tuning Technique
- Article from:
- US Fed News Service, Including US State News
- Article date:
- July 19, 2008
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ALEXANDRIA, Va., July 19 -- Shengwu Chang of South Hamilton, Mass., Joseph C. Olson of Beverly, Mass., and Damian Brennan of Gloucester, Mass., have developed a system for tuning an ion implanter system.
According to the U.S. Patent & Trademark Office: "A technique for tuning an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for tuning an ion implanter system having multiple beam-line elements. The method may comprise establishing one or more relationships among the multiple beam-line elements. The method may also comprise adjusting the multiple beam-line elements in a coordinated manner, based at least in part on the ...