News wire article from our research archive:

Japanese Inventor Develops Stitch Structure

ALEXANDRIA, Va., Aug. 7 -- Osamu Yasuzawa of Toyonaka, Japan, has developed a stitch structure for sewing machine.

According to the U.S. Patent & Trademark Office: "A stitch structure capable of effectively preventing the occurrence of raveling peculiar to double chain stitches irrespective of sewing conditions is provided by the stitch structure of double chain stitches including a plural number of needle threads forming rows of thread loops at the rear face of a cloth and one looper thread entwined with the rows of thread loops at the rear face of the cloth; wherein the looper thread is cut at one side of the positions at which it is entwined in the mode of interlacing with the ...

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