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Article: Patents: Idaho Inventors Develop Masking Material
- Article from:
- US Fed News Service, Including US State News
- Article date:
- February 6, 2009
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ALEXANDRIA, Va., Feb. 6 -- Zhiping Yin and Gurtej S. Sandhu, both of Boise, Idaho, have developed a masking method. The inventors were issued U.S. Patent No. 7,470,606 on Dec. 30, 2008.
The patent has been assigned to Micron Technology Inc., Boise. The original application was filed on July 31, 2006.
According to the U.S. Patent & Trademark Office: "The invention includes masking methods. In one implementation, a masking material which includes boron doped amorphous carbon is formed over a feature formed on a semiconductor substrate. The masking material includes at least about 0.5 atomic percent boron. The masking ...