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Article: Publication No. WO/2009/098213 Published on Aug. 13, Assigned to Micronic Laser Systems for Mura Effect Reduction Method, Apparatus (Swedish Inventor)
- Article from:
- US Fed News Service, Including US State News
- Article date:
- August 17, 2009
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GENEVA, Aug. 17 -- Fredrik Sjostrom, Sweden, has developed methods and apparatuses for reducing mura effects in generated patterns.
The patent has been assigned to Micronic Laser Systems AB, Taby, Sweden.
According to an abstract posted by the World Intellectual Property Organization, the invention relates to a "method for generating a pattern on a workpiece is provided. In one method for generating a pattern on a workpiece, at least two sweeps or exposure fields are calibrated based on at least two different ...