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Article: Patent No. 7,595,141 Issued on Sept. 29, Assigned to AZ Electronic Materials USA for Coating Composition (New Jersey Inventors)
- Article from:
- US Fed News Service, Including US State News
- Article date:
- October 3, 2009
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ALEXANDRIA, Va., Oct. 3 -- Takanori Kudo of Bedminster, N.J., Munirathna Padmanaban of Bridgewater, N.J., and Ralph R. Dammel of Flemington, N.J., have developed a composition for coating over a photoresist pattern. The inventors were issued U.S. Patent No. 7,595,141 on Sept. 29.
The patent has been assigned to AZ Electronic Materials USA Corp., Somerville, N.J.
According to the abstract released by the U.S. Patent & Trademark Office: "The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. ...
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Article: South Korean Inventor Develops Semiconductor Device with ...
US Fed News Service, Including US State News;
May 26, 2008 ;
422 words
...ALEXANDRIA, Va., May 26 -- Tae O. Jung of Seoul, South Korea, has developed a semiconductor device. According to the U.S. Patent & Trademark Office: "A method for manufacturing a semiconductor device includes expanding an active region and a recess region by an epitaxial growth process. As a
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