Article: Patent No. 7,609,003 Issued on Oct. 27, Assigned to Semequip for Ion Implantation System (Massachusetts, California Inventors)

ALEXANDRIA, Va., Nov. 4 -- George P. Sacco Jr., of Wakefield, Mass., Wade A. Krull of Marblehead, Mass., Thomas N. Horsky of Boxborough, Mass., and Brian C. Cohen of San Clemente, Calif., have developed a ion implantation system and control method. The inventors were issued U.S. Patent No. 7,609,003 on Oct. 27.

The patent has been assigned to Semequip Inc., Billerica, Mass.

According to the abstract released by the U.S. Patent & Trademark Office: "Ion implantation with high brightness, ion beam by ionizing gas or vapor, e.g. of dimers, or decaborane, by direct electron impact ionization adjacent the outlet aperture of the ionization chamber ). Preferably: conditions are maintained that ...

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